Note that for the sample with oblique sputtering angle of 0°, the results of the static magnetic measurements revealed that the as-deposited CoZr structured film possesses in-plane uniaxial anisotropy weakly. This was induced by uniaxial stress induced due to gradient sputtering [27]. Hysteresis loops of the easy magnetization direction were substantially a rectangle, while remanence ratio (M r /M s) was close to 1. Moreover,

the difference between easy and hard axis loops Quisinostat datasheet increased with the increase of oblique sputtering angle, which indicated change of magnetic anisotropy. Figure 2 M / M s loops along both easy axes and selleck products hard axes. (a) 0°, (b) 20°, (c) 40°, and (d) 60° samples. The overall dependences of anisotropy

field H k and coercivity of easy axis direction with various oblique sputtering angles were summarized in Figure 3. Here, H k could be estimated by checking the cross point of the central line of Regorafenib manufacturer the hard axis loop with the counter extension of the magnetization saturation line [28]. With increasing oblique sputtering angle, the coercivity in the easy axis (H ce) increased slightly from 10 to 27 Oe. In addition, the coercivity of nanostructure films was larger than that of continuous films [18, 29], which was attributed to the change in the interaction of shape anisotropy and inhomogeneous magnetization rotation caused by the nanohill pattern of the magnetic films. As the angle increased, H k increased monotonically, which was attributed to anisotropy induced by gradient sputtering and oblique sputtering. With increasing oblique sputtering angle, anisotropy induced by oblique sputtering was increased and played a dominant role

gradually. Therefore, H k increased with increasing oblique sputtering angle. Figure 3 The static anisotropy effective field and the coercivity versus the oblique sputtering angle. Figure 4 shows the dependence of complex permeability μ = μ’ − j μ” on frequency for the films with different Resminostat oblique sputtering angles measured by microstrip method using a vector network analyzer (PNA E8363B). The μ’ and μ” represent the real and imaginary part of complex permeability. Due to weak magnetic anisotropy in the sample with an oblique sputtering angle of 0°, the curve of complex permeability depending on frequency was almost unchanged. Hence, the data was not included here. From Figure 4b, the peak of the imaginary complex permeability shifted to high frequency with increasing oblique sputtering angle. Furthermore, the linewidth of all samples was above 1 GHz, which was larger compared with that of continuous films at around 0.5 GHz [30].