Corresponding to this, the pace of the introduction of new technologies becomes slower. For the long term, the limit of the downsizing is a big concern. The limit is expected to be at the gate length of around 5 nm because of the too huge off-leakage current in the entire chip.
Until that we will have probably six more generations or ‘technology nodes’, considering that we are now in the so-called 45 nm generation. It would take probably 20-30 years until G418 cost we reach the final limit, because the duration between the generations will become longer when approaching the limit. In order to suppress the off-leakage current, double gate (DG) or fin-FET type MOSFETs are the most promising. Then, it is a natural extension for DG FETs to evolve to Si-nanowire MOSFETs as the ultimate structure of transistors for CMOS circuit applications. Si-nanowire FETs are more attractive than the conventional
DG FETs because of higher on-current conduction due to their quantum nature and also because of their adoptability for high-density integration including that of 3D. Then, what will come next after reaching the final limit of the downsizing? The answer is new algorithm. In the latter half of this SB525334 in vitro century, the application of algorithm used for the natural bio system such as the brains of insects and even human will make the integrated circuits operation tremendously high efficiency. Much higher performance with ultimately low power consumption Compound C chemical structure will be realized. (C) 2009 Elsevier B.V. All rights reserved.”
“A series of high molecular weight polymethylsilsesquioxanes (PMSQs) were synthesized through polymerization of an isolated hydroxyl-substituted cyclic siloxane stereoisomer, cis-trans-cis 1,3,5,7 tetramethyl 1,3,5,7 tetrahydroxyl cyclosiloxane, for interlayer dielectric (ILD) application as low dielectric materials. The molecular weights of PMSQs were controlled by varying
polycondensation time. Structural analyses of the obtained PMSQs were carried out by gel chromatography (GPC), FTIR, Si-29 NMR, static light scattering (SLS), solution X-ray scattering, and X-ray diffraction. The change in molecular shape of the PMSQs went from linear to branched in structure as molecular weight increased. Furthermore, thin film properties were investigated for application as interlayer dielectric materials. As structural branching increased, its properties showed isotropic tendencies, relatively high modulus (5.4 GPa), and low dielectric constant (2.74) with increase in the inter-molecular space.”
“The current literature describes the possible risks for bone fracture in chronic analgesics users.